Oxygen-Interstitials and Group-V Element Doping for p-Type ZnO

Date

2013-3

Type

Article

Journal title

International Journal of Physics and Mathematical Science

Issue

Vol. 75 No. 0

Author(s)

AM Gsiea, JP Goss, PR Briddon, KM Etmimi

Pages

576 - 579

Abstract

In realizing devices using ZnO, a key challenge is the production of p-type material. Substitution of oxygen by a group-V impurity is thought to result in deep acceptor levels, but a candidate made up from a complex of a group-V impurity (P, As, Sb) on a Zn site coupled with two vacant Zn sites is widely viewed as a candidate. We show using density-functional simulations that in contrast to such a view, complexes involving oxygen interstitials are energetically more favorable, resulting in group-V impurities coordinated with four, five or six oxygen atoms